Raith is proud to sponsor the first symposium on Direct write, optical, ion and electron beam lithography at the TU Delft, the Netherlands.
The symposium features technical experts from Heidelberg Instruments, Nanoscribe, ZEISS, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.
TU Delft and Kavli Nanolab Delft make modern nanofabrication capabilities available to the community; we also welcome researchers from industry and other universities.
Don’t miss the opportunity, to get a broad overview of different aspects of nanolithography and to meet experts in all sorts of nanolithography disciplines.
Symposium
Date: May 16th, 2018; 9 am – 5 pm
Venue: Kavli Nanolab Delft
Lorentzweg 1, 2628 CJ Delft
The Netherlands
Registration fee: Participation is free for registerd participants
Deadline for registration: April 30th, 2018
>>> Click here to register <<< as well as for more information and further details (agenda available on our website)