MNE 2020 has unfortunately been cancelled, however Raith are still going to bring this year’s user meeting to you! The Raith User Meeting will be a four day online session, covering all aspects of Raith’s products along with a number of user presentations. Learn about the latest product updates, application notes and speak to product specialists. Download Agenda overview for the complete Raith Online User Meeting Europe 2020 here. General User Meeting Join the General User Meeting and learn about what…
Electron beam lithography or EBL, is a powerful nanofabrication tool that enables the creation of nanometer sized features. It is a top-down approach to nanofabrication. This means you start with something big, such as a silicon wafer, and process it into smaller devices, such as transistors. Find out more about electron beam lithography with this video created by Raith in partnership with nano@stanford! And take a look at the Raith product line and their enabling technologies.
A Raith Voyager system has been installed in Bristol University in the School of Physics. Using their newly developed eWRITE column architecture, the Voyager is recommended for all industrial and academic electron beam lithography applications where the important objectives are high write throughput and maximum resolution.
A Raith EBPG5200 has been installed in the Maxwell Centre at the University of Cambridge. With a thermal field emission gun which operates at 100 kV allows for high resolution features and high aspect ratios. The system is flexible and can operate for small scale (lab) projects up to large scale production. The EBPG5200 bridges between university research activities and wafer scale manufacturing.