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Raith User Meeting

Raith User Meeting 2020

MNE 2020 has unfortunately been cancelled, however Raith are still going to bring this year’s user meeting to you! The Raith User Meeting will be a four day online session, covering all aspects of Raith’s products along with a number of user presentations. Learn about the latest product updates, application notes and speak to product specialists. Download Agenda overview for the complete Raith Online User Meeting Europe 2020 here. General User Meeting Join the General User Meeting and learn about what…

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Upgrade Leo 982

What to do with an ageing SEM – The Upgrade Route

The column architecture of a scanning electron microscope has not changed dramatically in the last few decades. If you compare a SEM column from the 90’s with a SEM column that was built yesterday, the mechanics will be remarkably similar. An electron source, some lenses, beam deflectors and a detector. What has changed are the control electronics. A bit of history Before the late 90’s, most scanning electron microscopes were analogue and controlled via dials and knobs, while imaging on…

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raith user meeting

Raith User Meeting at MNE 2019

This year Raith held their European User Meeting at MNE on the Sunday 22nd of September. There were a total of 46 attendees from across Europe, of which 5 were from UK institutions. All the Raith product managers were in attendance to answer users’ questions. In parallel, the EBPG/VB user meeting (ELBUM) was also held. Prior to the start of the meetings we took part in a walking tour around the old city of Rhodes. Enjoyed by many of the…

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raith logo

What is Electron Beam Lithography?

Electron beam lithography or EBL, is a powerful nanofabrication tool that enables the creation of nanometer sized features. It is a top-down approach to nanofabrication. This means you start with something big, such as a silicon wafer, and process it into smaller devices, such as transistors. Find out more about electron beam lithography with this video created by Raith in partnership with nano@stanford! And take a look at the Raith product line and their enabling technologies.

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Raith Micrograph Award Winners

Raith Micrograph Award

Raith are once again inviting their users to share their interesting and attractive results in the form of a micrograph. The images will be shared with the international Raith community, and three prizes will be awarded. You could win a sponsorship to attend an international nanotechnology related conference including flights and accommodation! To find out more, visit the Raith website where you can find all the entry details.

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Come and Visit Us – Booth 606 at MMC

Come and visit us on our booth at Microscience Microscopy Congress 2019 and ask us about our SEM upgrades and electron microscopy support services. Demo an upgraded Philips XL30 running on Windows 10 with live topographical imaging and remote connection. With DISS5 you can capture up to 4 simultaneous signals, enabling the creation of live false colour images.

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MMC 2019

EM Systems Support will be exhibiting at this year’s Microscience Microscopy Congress 2019. Come and visit us on booth 606 and see our live demo system of an upgraded Philips/FEI XL30. In collaboration with Point Electronic, we will be presenting an upgraded and refurbished XL30 with new control electronics and software. If you would like to book a demo or would like further information on the system, please don’t hesitate to contact us. Booth 606 – 2nd to 4th of…

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EM Systems Support – Raith China Meet-up at SEMICON China

During Daniel’s recent visit to SEMICON China, he had the opportunity to drop in on the Raith China exhibition booth. Catching up with Yue Tian and Truman Zhu to discuss the Raith product lines and exciting new projects. SEMICON China is on until March 22nd 2019 and Raith is located at booth #2685. You can also join Raith at the DPG Spring Meeting in Regensburg, Raith will be holding ‘Lunch & Learn’ sessions, support sessions and a user meeting. Visit…

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Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Raith is proud to sponsor the first symposium on Direct write, optical, ion and electron beam lithography at the TU Delft, the Netherlands. The symposium features technical experts from Heidelberg Instruments, Nanoscribe, ZEISS, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities. TU Delft and Kavli Nanolab Delft make modern nanofabrication capabilities available to the community; we also welcome researchers from industry and other universities. Don’t miss the opportunity, to get a broad overview…

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