New high aspect ratio resist about to be launched

We have been involved in developing a novel resist and are inviting Electron Beam and Ion Beam researchers to try this resist.

We can supply 1 cm x 1 cm silicon substrates with a variety of  coating thickness.

Two resist types are currently on offer:

EBL 968     - for Electron beam lithography

designed to give improved aspect ratios, to assist dry etching

and

IBL 968        - for Ion beam lithography

designed to be resistive to Ion beams (a very insensitive resist)

Data sheets are available.

Please enquire.E M Systems Support Ltd