Electron beam lithography or EBL, is a powerful nanofabrication tool that enables the creation of nanometer sized features. It is a top-down approach to nanofabrication. This means you start with something big, such as a silicon wafer, and process it into smaller devices, such as transistors. Find out more about electron beam lithography with this video created by Raith in partnership with nano@stanford! And take a look at the Raith product line and their enabling technologies.
Raith are once again inviting their users to share their interesting and attractive results in the form of a micrograph. The images will be shared with the international Raith community, and three prizes will be awarded. You could win a sponsorship to attend an international nanotechnology related conference including flights and accommodation! To find out more, visit the Raith website where you can find all the entry details.