Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Raith is proud to sponsor the first symposium on Direct write, optical, ion and electron beam lithography at the TU Delft, the Netherlands. The symposium features technical experts from Heidelberg Instruments, Nanoscribe, ZEISS, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities. TU Delft and Kavli Nanolab Delft make modern nanofabrication capabilities available to the community; we also welcome researchers from industry and other universities. Don’t miss the opportunity, to get a broad overview…

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Raith EBL system installed at Cambridge University

A Raith EBPG5200 has been installed in the Maxwell Centre at the University of Cambridge. With a thermal field emission gun which operates at 100 kV allows for high resolution features and high aspect ratios. The system is flexible and can operate for small scale (lab) projects up to large scale production. The EBPG5200 bridges between university research activities and wafer scale manufacturing.

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