Electron Beam Lithography

Raith User Meeting

Raith User Meeting 2020

MNE 2020 has unfortunately been cancelled, however Raith are still going to bring this year’s user meeting to you! The Raith User Meeting will be a four day online session, covering all aspects of Raith’s products along with a number of user presentations. Learn about the latest product updates, application notes and speak to product specialists. Download Agenda overview for the complete Raith Online User Meeting Europe 2020 here. General User Meeting Join the General User Meeting and learn about what…

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raith user meeting

Raith User Meeting at MNE 2019

This year Raith held their European User Meeting at MNE on the Sunday 22nd of September. There were a total of 46 attendees from across Europe, of which 5 were from UK institutions. All the Raith product managers were in attendance to answer users’ questions. In parallel, the EBPG/VB user meeting (ELBUM) was also held. Prior to the start of the meetings we took part in a walking tour around the old city of Rhodes. Enjoyed by many of the…

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EM Systems Support – Raith China Meet-up at SEMICON China

During Daniel’s recent visit to SEMICON China, he had the opportunity to drop in on the Raith China exhibition booth. Catching up with Yue Tian and Truman Zhu to discuss the Raith product lines and exciting new projects. SEMICON China is on until March 22nd 2019 and Raith is located at booth #2685. You can also join Raith at the DPG Spring Meeting in Regensburg, Raith will be holding ‘Lunch & Learn’ sessions, support sessions and a user meeting. Visit…

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Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Raith is proud to sponsor the first symposium on Direct write, optical, ion and electron beam lithography at the TU Delft, the Netherlands. The symposium features technical experts from Heidelberg Instruments, Nanoscribe, ZEISS, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities. TU Delft and Kavli Nanolab Delft make modern nanofabrication capabilities available to the community; we also welcome researchers from industry and other universities. Don’t miss the opportunity, to get a broad overview…

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Raith EBL system installed at Cambridge University

A Raith EBPG5200 has been installed in the Maxwell Centre at the University of Cambridge. With a thermal field emission gun which operates at 100 kV allows for high resolution features and high aspect ratios. The system is flexible and can operate for small scale (lab) projects up to large scale production. The EBPG5200 bridges between university research activities and wafer scale manufacturing.

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