Electron beam lithography or EBL, is a powerful nanofabrication tool that enables the creation of nanometer sized features. It is a top-down approach to nanofabrication. This means you start with something big, such as a silicon wafer, and process it into smaller devices, such as transistors. Find out more about electron beam lithography with this video created by Raith in partnership with nano@stanford! And take a look at the Raith product line and their enabling technologies.
Raith are once again inviting their users to share their interesting and attractive results in the form of a micrograph. The images will be shared with the international Raith community, and three prizes will be awarded. You could win a sponsorship to attend an international nanotechnology related conference including flights and accommodation! To find out more, visit the Raith website where you can find all the entry details.
Come and visit us on our booth at Microscience Microscopy Congress 2019 and ask us about our SEM upgrades and electron microscopy support services. Demo an upgraded Philips XL30 running on Windows 10 with live topographical imaging and remote connection. With DISS5 you can capture up to 4 simultaneous signals, enabling the creation of live false colour images.
During Daniel’s recent visit to SEMICON China, he had the opportunity to drop in on the Raith China exhibition booth. Catching up with Yue Tian and Truman Zhu to discuss the Raith product lines and exciting new projects. SEMICON China is on until March 22nd 2019 and Raith is located at booth #2685. You can also join Raith at the DPG Spring Meeting in Regensburg, Raith will be holding ‘Lunch & Learn’ sessions, support sessions and a user meeting. Visit…
Raith is proud to sponsor the first symposium on Direct write, optical, ion and electron beam lithography at the TU Delft, the Netherlands. The symposium features technical experts from Heidelberg Instruments, Nanoscribe, ZEISS, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities. TU Delft and Kavli Nanolab Delft make modern nanofabrication capabilities available to the community; we also welcome researchers from industry and other universities. Don’t miss the opportunity, to get a broad overview…
Raith GmbH is proud to present VELION, the new FIB-SEM for FIB-centric nanofabrication. With its unique set-up of a vertical FIB-column it allows for versatile use in four different operation modes. Find out about the FIB-SEM where FIB truly comes first. Find Out More!
A Raith Voyager system has been installed in Bristol University in the School of Physics. Using their newly developed eWRITE column architecture, the Voyager is recommended for all industrial and academic electron beam lithography applications where the important objectives are high write throughput and maximum resolution.
A Raith EBPG5200 has been installed in the Maxwell Centre at the University of Cambridge. With a thermal field emission gun which operates at 100 kV allows for high resolution features and high aspect ratios. The system is flexible and can operate for small scale (lab) projects up to large scale production. The EBPG5200 bridges between university research activities and wafer scale manufacturing.
EM Analytical, a spin off from EM Systems Support, held a launch event in October. Providing analytical services to the scientific industry, EM Analytical is an open access and analysis facility at Alderley Park. They welcome anyone from any industry who might be interested in running samples or full projects with them.